Method for making a mask having a sloped relief

Details Method for making a mask having a sloped relief Method for making a mask having a sloped relief

1975-07-03

1976-10-19

Kimlin, Edward C.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 36, 96 362, 156 3, 156 8, 156 11, 355 75, 118504, G03C 500, G03C 1100, B29C 1708

Patent

active

039868761

ABSTRACT:
The invention provides a method for making a relief mask used for pattern neration in planar thin film overlays, which relief mask is structurally formed to produce intimate contact between a photoresist surface and a masking pattern during exposure of the photoresist surface. The present method comprises the steps of:

REFERENCES:
patent: 1922434 (1933-08-01), Gundlach
patent: 3585121 (1971-06-01), Franks et al.
patent: 3751250 (1973-08-01), Moscony et al.
patent: 3824014 (1974-07-01), Abita

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