Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2000-06-29
2002-01-29
Pianalto, Bernard (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C101S114000, C427S077000, C427S122000, C427S123000, C427S126300, C427S261000, C427S264000, C427S265000, C427S270000, C427S271000, C427S367000, C427S372200, C427S380000, C427S383100, C427S404000, C427S419200, C427S557000
Reexamination Certificate
active
06342276
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to a field emission display and in particular to a method of forming a fine electrode pattern of field emitting material on a substrate of such a display.
BACKGROUND OF THE INVENTION
As shown
FIG. 1
, a conventional field emission display is comprised of a rear substrate
12
, a plurality of parallel cathode electrode lines
16
formed on the rear substrate
12
, thin films
20
of electron-emitting material formed on the cathode electrodes
16
, a front substrate
14
spaced apart from the rear substrate
12
and a plurality of parallel anode electrode lines
18
formed on the undersurface of the front substrate
14
. Further for a color display an RGB phosphor layer
22
is formed on top of the anode electrodes
18
. When a predetermined voltage applied between a selected anode electrode
18
and a selected cathode
16
electrical current flows in parallel with the film
20
. Then electrons are emitted from the surface of the emitter film
20
and accelerated toward the front substrate
14
and collide with the phosphor layer
22
to cause emission of visible light.
As electron emitting material diamond-like carbon, carbon fiber or carbon nanotube are commonly used. And a transparent ITO is generally used as material for cathode electrodes.
A pattern of emitter may be formed by either photolithography or printing. The first method involves forming a thin film of emitter and wet etching to form a desired pattern. According to the second method a carbon material is made in paste and coated on cathode electrodes by a thick film technique such as printing. However, a fine pattern of emitter may be possible with the first method but it requires costly and complex process. The latter is relatively less costly but it is difficult to produce a fine pattern of less than 100 micron because of distances between pixels in a mesh used in a thick film technique.
SUMMARY OF THE INVENTION
It is an objective of the present invention to provide a solution to a problem mentioned above. Namely, a method that enables forming of a fine emitter pattern and yet having improved emission efficiency.
Christie Parker & Hale LLP
Pianalto Bernard
Samsung SDI & Co., Ltd.
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