Method for making a bipolar transistor having a silicon carbide

Fishing – trapping – and vermin destroying

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437 32, 437100, 437105, 148DIG11, 148DIG148, H01L 21265

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052720969

ABSTRACT:
A layer of silicon carbide (33, 38, 41) is utilized in forming a bipolar transistor (30, 40). The transistor (30, 40) is formed on a substrate (31, 32) that has a single crystal silicon surface. The layer of silicon carbide (33, 38, 41) is epitaxially formed on the single crystal silicon surface. Thereafter, a layer of silicon (34) is epitaxially formed on the layer of silicon carbide (33, 38, 41). The silicon carbide (33, 38, 41) functions as an active transistor layer or alternately is within the transistor's depletion region.

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