Method for low temperature chemical vapor deposition of aluminid

Coating processes – Interior of hollow article coating – Coating by vapor – gas – mist – or smoke

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427238, 427239, 427250, 427253, 4272551, 4272552, 4272557, 427124, 4271263, 4273837, B05D 722, C23C 1600

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active

055038743

ABSTRACT:
A method is disclosed to deposit aluminum and a metal oxide on substrates for improved corrosion, oxidation, and erosion protection. Low temperature chemical vapor deposition is used. A homogeneous biphase coating may be deposited, as well as layers of aluminum and metal oxides.

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"Thin Film Processes", edited by J. L. Vossen and W. Kern, Academic Press (1978) pp. 257-331.

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