Method for liquid phase epitaxial growth

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118415, 437120, 437130, 437133, H01L 21208

Patent

active

047988126

ABSTRACT:
A method of fabricating a solid state device having chemically bound arsenic and phosphorous includes carrying out liquid phase epitaxial growth in the presence of partial pressures of arsenic and phosphorus.

REFERENCES:
patent: 3565702 (1971-02-01), Nelson
patent: 3933538 (1976-01-01), Akai et al.
patent: 4661175 (1987-04-01), Kuphal et al.
H. Nagai et al, "Thermal Deformation of Surface Corrugations on InGaAsP Crystals", Journal of Crystal Growth, vol. 71, pp. 225-231, 1985.
Yu. P. Khukhryanskii et al., "Pressure of the Vapor Phase Above Solutions of InP and InAsihTin", Izv. Akad. Nauk SSSR, Neorg-Mater, vol. 13, No. 5, May 1977, pp. 785-788.
Logan et al., J. of Crystal Growth, vol. 76, Jul. 1986, pp. 17-30, North Holland, Amsterdam.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for liquid phase epitaxial growth does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for liquid phase epitaxial growth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for liquid phase epitaxial growth will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2413535

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.