Method for inspecting transmission line characteristic of a...

Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – For fault location

Reexamination Certificate

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Details

C324S642000, C257S048000, C257S506000

Reexamination Certificate

active

07622930

ABSTRACT:
A method for inspecting a semiconductor device includes establishing a first circuit state in which electrical conduction through at least one of branch transmission line portions is established and electrical conduction through at least one other branch transmission line portion is prevented. Then, electrical signal reflection characteristics of the transmission line are measured. The method also includes establishing a second circuit state in which electrical conduction through the at least one of the branch transmission line portions is prevented and electrical conduction through the at least one other branch transmission line portions is established. Then, the electrical signal reflection characteristics of the transmission line are measured. The second circuit state is a mirror image of the first circuit state with respect to the primary transmission line. The measured values are compared.

REFERENCES:
patent: 4908576 (1990-03-01), Jackson
patent: 6555907 (2003-04-01), Katoh
patent: 7106146 (2006-09-01), Tsukahara et al.
patent: 11-186803 (1999-07-01), None
patent: 2000-188501 (2000-07-01), None
patent: 2002-33602 (2002-01-01), None
patent: 2002-237574 (2002-08-01), None

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