Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2011-05-31
2011-05-31
Desire, Gregory M (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C250S206100, C250S559450, C356S237200, C382S144000
Reexamination Certificate
active
07953269
ABSTRACT:
In a pattern-defect inspection method for inspecting a defect in an inspection pattern by comparing an image of the inspection pattern with an image of a reference pattern, inspection sensitivity is adjusted in accordance with the number of corner portion and so on of the reference pattern.
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International Search Report of PCT/JP2006/300349, date of mailing Apr. 18, 2006.
Desire Gregory M
Fujitsu Semiconductor Limited
Westerman Hattori Daniels & Adrian LLP
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