Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2005-11-22
2005-11-22
Smith, Zandra V. (Department: 2877)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C356S124000, C430S022000
Reexamination Certificate
active
06967719
ABSTRACT:
There is here disclosed a method for inspecting an exposure apparatus, comprising illuminating a mask, in which a mask-pattern including at least a set of a first mask-pattern and a second mask-pattern mutually different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting an image of the mask-pattern toward an image-receiving element, and measuring a mutual relative distance between images of the first and second mask-patterns exposed and projected on the image-receiving element, thereby inspecting a state of an optical system of the exposure apparatus.
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Ikeda Takahiro
Inoue Soichi
Mimotogi Shoji
Sato Takashi
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Smith Zandra V.
Stock, Jr. Gordon J.
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