Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Utilizing particle treatment of selected regions to form...
Patent
1999-05-19
2000-11-14
King, Roy V.
Superconductor technology: apparatus, material, process
Processes of producing or treating high temperature...
Utilizing particle treatment of selected regions to form...
505730, 427 62, 427 63, H01L 3924
Patent
active
061470325
ABSTRACT:
An implant patterned superconductive device and a method for indirect implant-patterning of oxide superconducting materials is provided. The method forms a device having an oxide superconducting layer on a substrate, deposits a passivation layer atop the oxide superconducting layer, and implants chemical impurities in a selected portion of the superconducting layer through the passivation layer. This modifies the conductivity of the selected portion of the oxide superconducting layer and electrically isolates the selected portion from the non-selected portion of the oxide superconducting layer. The passivation layer is made of a material less susceptible to implant damage than the oxide superconducting layer to allow inhibition of the oxide superconducting layer while protecting the crystalline structure of the top surface of the oxide superconducting layer and keeping it planarized. The passivation layer is preferably a dielectric material having a crystal lattice structure which is compatible to that of the oxide superconducting layer. The method is especially efficient for the fabrication of devices with multiple layers of oxide superconductive materials because it does not degrade the epitaxial template's crystalline structure.
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Chan Hugo W-K.
LaGraff John R.
Murduck James M.
Pettiette-Hall Claire L.
King Roy V.
Thousand Connie M.
TRW Inc.
Yatsko Michael S.
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