Method for increasing the yield of trichlorosilane in the fluidi

Details Method for increasing the yield of trichlorosilane in the fluidi Method for increasing the yield of trichlorosilane in the fluidi

1990-01-23

1991-11-05

Chaudhuri, Olik

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

423DIG6, C01B 33107

Patent

active

050630407

ABSTRACT:
A method for increasing the trichlorosilane yield in the hydrochlorination of silicon in a fluidized bed involves chilling the gas mixture issuing from the fluidized bed in the shortest possible time immediately after leaving the fluidized bed to temperatures below 550.degree. C. When the temperature of the fluidized bed is below 550.degree. C., the gas mixture is chilled to temperature 100.degree. C. lower than the reaction temperature in the fluidized bed. The method makes it possible, at a reaction temperature of, for example, 800.degree. C. to increase the 16 to 20% trichlorosilane yields obtained formerly at this temperature to 55%, especially when gaseous silicon tetrachloride is also added to the fluidized bed.

REFERENCES:
patent: 4117094 (1978-09-01), Blocher et al.
patent: 4165363 (1979-08-01), Weigert et al.
patent: 4217334 (1980-08-01), Weigert et al.
Teichmann et al., Z. Anorg. Allg. Chem. 347.145.

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