Gas separation: apparatus – Electric field separation apparatus – Electrode cleaner – apparatus part flusher – discharger – or...
Patent
1976-09-15
1978-12-26
Kimlin, Edward C.
Gas separation: apparatus
Electric field separation apparatus
Electrode cleaner, apparatus part flusher, discharger, or...
96 27R, 96 36, 96 362, 96 384, 96 44, 29574, 29575, 29407, 156626, 156901, 427 8, 356389, G03C 500, G03C 504
Patent
active
041314727
ABSTRACT:
An improvement in the process of manufacturing integrated circuits to enhance the yield, including the steps of tracking which of the individual dies on a photomask or related series of photomasks has produced a predominance of defective chips on the semiconductor wafer, then correcting the die images on the master photomasks and then producing new working masks. This procedure may be repeated several times, each time reducing the number of defect-bearing die images on the photomask and thereby providing a means by which a semiconductor device manufacturer can obtain better yields.
REFERENCES:
patent: 3477848 (1969-11-01), Pritchard
patent: 3506442 (1970-04-01), Kerwin
patent: 3545854 (1970-12-01), Olsson
patent: 3591284 (1971-07-01), Liebman
patent: 3607267 (1971-09-01), Garrels
patent: 3615463 (1971-10-01), Kuschell
patent: 3615466 (1971-10-01), Sahni
patent: 3618201 (1971-11-01), Makimoto et al.
patent: 3647445 (1972-03-01), Burns
patent: 3647457 (1972-03-01), Kerwin
patent: 3674488 (1972-07-01), Dodd et al.
patent: 3742229 (1973-06-01), Smith et al.
patent: 3808527 (1974-04-01), Thomas
patent: 3855023 (1974-12-01), Spicer et al.
patent: 4037969 (1977-07-01), Feldman et al.
Kaplan, "A Microprocessor-Controlled Mask Inspection and Repair System", Solid State Technology, Apr. 1976, pp. 74-78.
MacDonald, Jr. James L.
Mink Richard A.
Align-Rite Corporation
Kimlin Edward C.
LandOfFree
Method for increasing the yield of batch processed microcircuit does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for increasing the yield of batch processed microcircuit , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for increasing the yield of batch processed microcircuit will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1127073