Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-09-27
1998-02-17
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430327, 430330, G03F 7023, G03F 738
Patent
active
057190038
ABSTRACT:
A photoresist composition comprising an alkali soluble resin and an ortho-naphthoquinone diazide sulfonic acid ester of a polyhydroxy alcohol. The photoresist is characterized by having at least a portion of its free hydroxyl groups on the photoactive compound blocked with an acid labile blocking group that generates a hydroxide upon cleavage.
REFERENCES:
patent: 4732837 (1988-03-01), Potvin et al.
patent: 5258257 (1993-11-01), Sinta et al.
patent: 5362600 (1994-11-01), Sinta et al.
Adams Timothy G.
Pai Daniel Y.
Sinta Roger F.
Goldberg Robert L.
Shipley Company L.L.C.
Young Christopher G.
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