Method for increasing doping uniformity in a flow flange reactor

Details Method for increasing doping uniformity in a flow flange reactor Method for increasing doping uniformity in a flow flange reactor

1994-10-31

1996-05-14

Breneman, R. Bruce

Fishing, trapping, and vermin destroying

437107, 437126, 437133, 117 84, H01L 2120

Patent

active

055167225

ABSTRACT:
The present invention comprises a method and apparatus for increasing doping uniformity in semiconductor devices produced in a flow flange reactor. One aspect of the present invention involves dividing the flow flange (12) of the reactor into a plurality of sections (14, 16, 18). Each section (14, 16, 18) is then subdivided into a plurality of subsections (52, 54, 56) including a first subsection (52), a second subsection (54) and a third subsection (56). A group III gas may then be dispersed in the first subsection (52) of at least one section (18). A group V gas may then be dispersed in a second subsection (54) of that section, while a dopant gas may also be dispersed in a third subsection (56) of that section (18).

REFERENCES:
patent: 4579623 (1986-04-01), Suzuki et al.
patent: 4980204 (1990-12-01), Fujii et al.
patent: 5304247 (1995-04-01), Kondo et al.
patent: 5472507 (1995-12-01), Yamaguchi et al.
"Emcore GS3200 flow flange reactor" Technical literature, Sep. 22, 1987.

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