Coating processes – Coating by vapor – gas – or smoke – Metal coating
Reexamination Certificate
2007-09-18
2007-09-18
Chen, Bret (Department: 1762)
Coating processes
Coating by vapor, gas, or smoke
Metal coating
C427S255700, C427S096800
Reexamination Certificate
active
10996145
ABSTRACT:
A method for increasing deposition rates of metal layers from metal-carbonyl precursors by mixing a vapor of the metal-carbonyl precursor with CO gas. The method includes providing a substrate in a process chamber of a deposition system, forming a process gas containing a metal-carbonyl precursor vapor and a CO gas, and exposing the substrate to the process gas to deposit a metal layer on the substrate by a thermal chemical vapor deposition process.
REFERENCES:
patent: 4851895 (1989-07-01), Green et al.
patent: 4929468 (1990-05-01), Mullendore
patent: 4938999 (1990-07-01), Jenkin
patent: 5171610 (1992-12-01), Liu
patent: 6303809 (2001-10-01), Chi et al.
patent: 6319832 (2001-11-01), Uhlenbrock et al.
patent: 6420583 (2002-07-01), Lienhard et al.
patent: 6440495 (2002-08-01), Wade et al.
patent: 6444263 (2002-09-01), Paranjpe et al.
patent: 6605735 (2003-08-01), Kawano et al.
patent: 6713373 (2004-03-01), Omstead
patent: 2003/0129306 (2003-07-01), Wade et al.
patent: 2004/0105934 (2004-06-01), Chang et al.
patent: 2005/0070100 (2005-03-01), Yamasaki et al.
patent: 2005/0081882 (2005-04-01), Greer et al.
patent: 2005/0110142 (2005-05-01), Lane et al.
patent: 2005/0186341 (2005-08-01), Hendrix et al.
patent: 0620291 (1994-10-01), None
patent: WO0026432 (2000-05-01), None
patent: WO2005034223 (2005-04-01), None
Czekaj, C. et al. “Inorganic Chemistry” 1988, 27, p. 8-10.
Wang et al., Low-temperature chemical vapor deposition and scaling limit of ultrathin Ru films, Applied Physics Letters, Feb. 23, 2004, pp. 1380-1382, vol. 84, No. 8, American Institute of Physics, Melville, NY.
European Patent Office, International Search Report and Written Opinion, Aug. 8, 2006, 9 pp.
European Patent Office, International Search Report and Written Opinion of corresponding PCT Application No. PCT/US2006/007675, dated Oct. 13, 2006, 9 pages.
Guidotti Emmanuel P.
Leusink Gerrit J.
Malhotra Sandra G.
McFeely Fenton R.
Suzuki Kenji
Chen Bret
International Business Machines Corp.
Tokyo Electron Limited
Wood Herron & Evans LLP
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