Method for increasing compression stress or reducing...

Details Method for increasing compression stress or reducing... Method for increasing compression stress or reducing...

2005-04-26

2005-04-26

Turner, Archene (Department: 1775)

Stock material or miscellaneous articles

Structurally defined web or sheet

Including components having same physical characteristic in...

C427S348000, C427S355000, C428S336000, C428S472000, C428S698000, C428S701000

Reexamination Certificate

active

06884496

ABSTRACT:
A method of increasing the compressive stress or of reducing the tensile residual stress of a CVD layer, a PCVD layer or PVD layer and a cutting insert for machining.The invention relates to a method of increasing the compressive residual stress or of reducing the tensile residual stress of a hard material outer layer or a hard material outermost layer in which the coated substrate after coating is subjected to a dry blast treatment using a granular blast agent that, according to the invention, has a maximum diameter of 150 μm.

REFERENCES:
patent: 5250367 (1993-10-01), Santhanam et al.
patent: 5318840 (1994-06-01), Ikeda et al.
patent: 5395680 (1995-03-01), Santhanam et al.
patent: 5576093 (1996-11-01), Yoshimura et al.
patent: 5597272 (1997-01-01), Moriguchi et al.
patent: 5861210 (1999-01-01), Lenander et al.
patent: 6090476 (2000-07-01), Thysell et al.
patent: 6187421 (2001-02-01), Moriguchi et al.
patent: 197 19 195 (1998-11-01), None
patent: 196 2 872 (2000-07-01), None
patent: 416824 (1991-03-01), None
patent: 0 727 510 (1996-08-01), None
patent: 02254144 (1990-10-01), None
patent: 06-057409 (1994-03-01), None
patent: 06-079502 (1994-03-01), None
patent: WO 9205296 (1992-04-01), None
patent: WO 9816665 (1998-04-01), None
patent: WO 9923275 (1999-05-01), None
patent: WO 0073532 (2000-12-01), None
“Effects of Shot Peening on CVD-Coated Cemented Carbide” by Sato et al., published Nov. 7, 1993.

Affiliated with

Also associated with

Rating

Method for increasing compression stress or reducing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for increasing compression stress or reducing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for increasing compression stress or reducing... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3412424