Semiconductor device manufacturing: process – Making passive device – Stacked capacitor
Patent
1998-04-14
2000-01-04
Bowers, Charles
Semiconductor device manufacturing: process
Making passive device
Stacked capacitor
438381, H01L 2120
Patent
active
060109440
ABSTRACT:
The present invention relates to a method for increasing capacity of a capacitor. The method includes forming a polysilicon spacer on sidewall of a first polysilicon electrode and then treating the polysilicon spacer with a phosphoric acid to form a roughened surface area on the polysilicon spacer and the first polysilicon electrode. By this arrangement, the overall surface area of the polysilicon spacer and the first polysilicon electrode can be increased and the capacity of a capacitor can be increased accordingly.
REFERENCES:
patent: 5286668 (1994-02-01), Chou
patent: 5744387 (1998-04-01), Tseng
patent: 5766995 (1998-06-01), Wu
Chen Chien-Hung
Chu Chih-Hsun
Huang Chi-Dar
Bowers Charles
Mosel Vitelic Incorporated
Thompson Craig
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