Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1998-06-22
2000-02-29
Gulakowski, Randy
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 2, 134 19, 427309, B05D 300
Patent
active
060296801
ABSTRACT:
Disclosed is a process for cleaning silicon surfaces of native oxide films. The process utilizes fluorine containing cleaning materials such as anhydrous hydrofluoric acid to clean the oxide from the surface. A fluorine containing particulate matter which forms on the surface as a result of the fluorine containing cleaning materials is then removed by heating the surface to a high temperature. The process is conducted in a non-oxidizing ambient and is preferably conducted in a cluster tool so that the heating step can take place in the same chamber of the cluster tool as later metal deposition step.
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Hawthorne Richard C.
Lee Whonchee
Gulakowski Randy
Markoff Alexander
Micron Technology Inc
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