Method for in-situ cleaning of polysilicon-coated quartz furnace

Details Method for in-situ cleaning of polysilicon-coated quartz furnace Method for in-situ cleaning of polysilicon-coated quartz furnace

1997-04-28

1998-12-22

Warden, Jill

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

134 3, 134 2218, 134 42, 438905, B08B 900

Patent

active

058513078

ABSTRACT:
A method for in-situ cleaning of polysilicon-coated quartz furnaces are presented. Traditionally, disassembling and reassembling the furnace is required to clean the quartz. This procedure requires approximately four days of down time which can be very costly for a company. In addition, cleaning the quartz requires large baths filled with a cleaning agent. These baths occupy a large amount of laboratory space and require a large amount of the cleaning agent. Cleaning the furnace in-situ eliminates the very time consuming procedure of assembling and disassembling the furnace and at the same time requires less laboratory space and less amount of cleaning agent. The polysilicon remover may be either a mixture of hydrofluoric and nitric acid or TMAH. TMAH is preferred because it less hazardous than hydrofluoric acid and compatible with more materials. The cleaning agent may be introduced into the furnace either from the built-in injectors or from additionally installed injectors. If the built-in injectors are used, the input system of the furnace is cleaned in addition to the quartz inner lining.

REFERENCES:
patent: 5294262 (1994-03-01), Nishimura
patent: 5380370 (1995-01-01), Niino et al.
patent: 5637153 (1997-06-01), Niino et al.
patent: 5679215 (1997-10-01), Barnes

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