Photocopying – Projection printing and copying cameras – Focus or magnification control
Reexamination Certificate
2006-12-25
2011-10-11
Nguyen, Hung Henry (Department: 2882)
Photocopying
Projection printing and copying cameras
Focus or magnification control
C355S053000
Reexamination Certificate
active
08035801
ABSTRACT:
A method for in-situ aberration measurement in an optical imaging system of lithographic tools. According to the method, a reticle pattern is imaged to form an imaged pattern by transmitting beams through a reticle via the optical imaging system. The imaged reticle pattern is shaped to have plural groups of imaged linewidths. The plural groups of imaged linewidths are measured using either of an image sensor, a CD-SEM and a microscope by modifying the intensity distribution at an exit pupil plane of the optical imaging system. The asymmetry and ununiformity of the imaged linewidths are calculated. Aberrations of the optical imaging system are calculated.
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Ma Mingying
Wang Fan
Wang Xiangzhao
Nguyen Hung Henry
Rabin & Berdo P.C.
Shanghai Micro Electronics Equipment Co., Ltd.
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