Method for in-line monitoring and controlling in...

Heating – Heating or heat retaining work chamber structure

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C219S448110, C430S330000, C356S237200

Reexamination Certificate

active

07445446

ABSTRACT:
A method of heat-treating resist coated manufacturing wafers in a processing system by establishing a temperature profile for each of a plurality of hotplates in the processing system, heat-treating the resist coated manufacturing wafers on the hotplates, obtaining CD metrology data from test areas on the heat-treated resist coated manufacturing wafers, determining CD variations for each hotplate from the CD metrology data, adjusting the temperature profile of one or more hotplates after determining the CD variations, and heat-treating additional resist coated manufacturing wafers on the hotplates after the adjusting.

REFERENCES:
patent: 6644965 (2003-11-01), Ookura et al.
patent: 6689519 (2004-02-01), Brown et al.
patent: 6806008 (2004-10-01), Schedel et al.
patent: 6891627 (2005-05-01), Levy et al.
patent: 6969829 (2005-11-01), Tsuruno et al.
patent: 6987572 (2006-01-01), Lakkapragada et al.
patent: 7101816 (2006-09-01), Kaushal et al.
patent: 7106433 (2006-09-01), Hasan
patent: 7187796 (2007-03-01), Phan et al.
patent: 7227628 (2007-06-01), Sullivan et al.
patent: 2002/0177094 (2002-11-01), Shirakawa
patent: 2002/0177245 (2002-11-01), Sonderman et al.
patent: 2003/0015493 (2003-01-01), Grasshoff et al.
patent: 2003/0186183 (2003-10-01), Ito et al.
patent: 2004/0241561 (2004-12-01), Chen et al.
patent: 2006/0024850 (2006-02-01), Monahan et al.
patent: 2006/0094131 (2006-05-01), Wang et al.
patent: 2006/0222975 (2006-10-01), Ke et al.
patent: 2006/0252000 (2006-11-01), Hayashi et al.
patent: 2007/0068453 (2007-03-01), Chen et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for in-line monitoring and controlling in... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for in-line monitoring and controlling in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for in-line monitoring and controlling in... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4037376

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.