Method for improving the quality of a titanium nitride layer inc

Details Method for improving the quality of a titanium nitride layer inc Method for improving the quality of a titanium nitride layer inc

1997-07-07

2000-07-11

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427535, 427255394, C23C 1634, C23C 1402, H05H 100

Patent

active

060869607

ABSTRACT:
The present invention is to provide a method for making a titanium nitride (TiN) layer, comprising the step of: forming the TiN layer out of a source materials; and exposing the TiN layer using the hydrogen and nitrogen plasma gases. Accordingly, the present invention has an effect that resistivity of the TiN layer decreases by eliminating the impurities therein and by decreasing the porosity thereof, and that the electrical stability of the TiN layer increases.

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