Method for improving the interface characteristics of CaF.sub.2

Fishing – trapping – and vermin destroying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156610, 156613, 156DIG73, 156DIG103, H01L 2102

Patent

active

052293335

ABSTRACT:
In one form of the invention, a method is disclosed for growing CaF.sub.2 on a silicon surface, comprising the steps of maintaining the silicon surface at a first temperature below approximately 500.degree. C., starting a deposition of CaF.sub.2 on the silicon surface, stopping the deposition, and then annealing the CaF.sub.2 in forming gas at a temperature below 600.degree. C.

REFERENCES:
C.-C. Cho, et al., "Substrate Orientation and Processing Effects on Strained CaF.sub.2 /Si Grown by Molecular Beam Epitaxy", The Japan Society of Applied Physics, Reprinted from Extended Abstracts of the 22nd Conference on Solid State Devices and Materials, pp. 1167-1168, Aug. 22-24, 1990.
C.-C. Cho, et al., "Electrical Properties of Low-Temperature-Grown CaF.sub.2 on Si(111)", Applied Physics Letter, pp. 338-340, 60 (3), Jan. 20, 1992.
R. W. Fathauer, et al., "MIS Characterization and Modeling of the Electrical Properties of the Epitaxial CaF.sub.2 /Si(111) Interface", Journal of Electronic Materials, pp. 169-175, vol. 16, No. 3, 1987.
R. People, et al., "Electrical Characterization of the CaF.sub.2 /Si-Epitaxial Insulator/Semiconductor Interface by MIS Admittance", Materials Research Society Symposium Proceedings, pp. 169-173, vol. 37, 1985.
T. P. Smith, III, et al., "The Electronic Properties of Epitaxial Calcium Fluoride-Silicon Structures", Materials Research Society Symposium Proceedings, pp. 295-305, vol. 54, 1986.
H. Y. Liu, et al., "A Study of Epitaxial Relations of CaF.sub.2 Films Grown on (111) Silicon by Molecular Beam Epitaxy", Mat. Res. Soc. Symp. Proc., pp. 111-116, vol. 221, 1991.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for improving the interface characteristics of CaF.sub.2 does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for improving the interface characteristics of CaF.sub.2 , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for improving the interface characteristics of CaF.sub.2 will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1760322

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.