Method for improving film quality of silica-based films

Details Method for improving film quality of silica-based films Method for improving film quality of silica-based films

1988-05-20

1990-02-13

Silverman, Stanley

Coating processes

Electrical product produced

Welding electrode

427377, 427299, B05D 306

Patent

active

049005820

ABSTRACT:
A coating solution for forming a silica-based film, having a given viscosity, is coated on a substrate such as a silicon wafer, this coating solution is dried to form a silica-based film, and this silica-based film is exposed to ultraviolet radiation in an atmosphere containing ozone at room temperature or while heating it preferably at a temperature of not more than 300.degree. C., particularly at a temperature of from 50.degree. to 200.degree. C., by means of a heating member such as a hot plate.
The film quality of the silica-based film can be improved by exposing it to ultraviolet radiation in the atmosphere containing ozone.

REFERENCES:
patent: 4605567 (1986-08-01), Muller et al.
patent: 4702936 (1987-10-01), Maeda et al.
patent: 4726969 (1988-02-01), Boccalon et al.

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