Method for improving current stability of field emission...

Electric lamp and discharge devices – With luminescent solid or liquid material – Vacuum-type tube

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C313S496000, C445S005000, C445S006000, C445S024000, C445S025000, C445S042000, C445S043000

Reexamination Certificate

active

06930446

ABSTRACT:
A method is provided for manufacturing a field emission device, the method including operating the field emission device in a pressure of at most about 10−8Torr for a selected period of time to evacuate outgassed materials and sealing the field emission device.

REFERENCES:
patent: 3839068 (1974-10-01), Miura
patent: 4392834 (1983-07-01), Smith
patent: 4929209 (1990-05-01), Matsuo et al.
patent: 5521461 (1996-05-01), Garcia
patent: 5564958 (1996-10-01), Itoh et al.
patent: 5729086 (1998-03-01), Jeong et al.
patent: 5788551 (1998-08-01), Dynka et al.
patent: 5827102 (1998-10-01), Watkins et al.
patent: 6042441 (2000-03-01), Konuma
patent: 6053791 (2000-04-01), Fujii et al.
patent: 2-299129 (1990-12-01), None
(A translation of Sakano is included).
Chalamala et al., “Residual Gas Effects on the Emission Characteristics of Active Mo Field-Emission Cathode Arrays,”SID 98 Digest, pp. 107-110 (1998).
Jüttner et al., “Stability of Field Electron Emission and Vacuum Breakdown, Investigations with Field Emission Microscopy and Auger Electron Spectroscopy,”Phys, Stat. Sol. 27:403-412 (1975).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for improving current stability of field emission... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for improving current stability of field emission..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for improving current stability of field emission... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3508546

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.