Method for improving atomic oxygen resistance

Details Method for improving atomic oxygen resistance Method for improving atomic oxygen resistance

1988-07-25

1990-12-25

Lusigman, Michael

Coating processes

With post-treatment of coating or coating material

Heating or drying

244158R, 427387, 4284111, 428447, B05D 302

Patent

active

049802062

ABSTRACT:
Filled fluorosilicone and filled fluorophosphazene composite films and unfilled fluorosilicone, fluorophosphazene, or copolymers provide atomic oxygen resistance to protect surfaces on spacecraft in low earth orbit. The preferred composite films are generally made by polymerizing suitable precursors on the exposed surfaces, the filler being mixed with the polymer precursors prior to curing. Second surface mirrors can be protected with these films while the flexibility of the mirror is retained.

REFERENCES:
patent: 3661833 (1972-05-01), Larson
patent: 4024306 (1977-05-01), Takamizawa et al.
patent: 4389504 (1983-06-01), St. Clair et al.
patent: 4492786 (1985-01-01), Evans et al.
patent: 4549004 (1985-10-01), von Au et al.
patent: 4624888 (1986-11-01), St. Clair et al.

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