Method for imprint lithography at constant temperature

Details Method for imprint lithography at constant temperature Method for imprint lithography at constant temperature

2011-07-05

2011-07-05

Wyrozebski, Kat (Department: 1746)

Plastic and nonmetallic article shaping or treating: processes

Direct application of electrical or wave energy to heat the...

C264S405000, C264S494000, C264S496000

Reexamination Certificate

active

07972553

ABSTRACT:
Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tpby means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and—postbaking the layer.

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