Method for identifying a blistered film in layered films

Details Method for identifying a blistered film in layered films Method for identifying a blistered film in layered films

1988-02-11

1989-06-27

Anderson, Bruce C.

Radiant energy

Calibration or standardization methods

250309, 2504923, 21912185, G01D 1800, G01N 2300

Patent

active

048432385

ABSTRACT:
In a method for identifying blistered film in layered films, a focused ion beam irradiates the approximate center of the blister and a portion which has no blister, and individual sets of the measurement data relating to the respective numbers of secondary electrons generated by the irradiation are compared to determine which film of layered films has blistered. Since the focused ion beam is employed, the present method is applicable to the detection of a small blister in layered films. Furthermore, since an enormous number of cutting operations as might have been required in the prior art are eliminated, the present method can be carried out, stably, positively and economically.

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Y. Mashiko et al., "Effects on Ion-Implantation-Induced Damages and Impurity on Platinum Silicide Formation", Journal of Applied Physics 53 (9), Sep. 1982, pp. 6144-6147.

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