Coating processes – Coating by vapor – gas – or smoke
Patent
1998-11-12
2000-12-26
Beck, Shrive
Coating processes
Coating by vapor, gas, or smoke
4272555, 427446, 427488, C23C 1600
Patent
active
061655546
ABSTRACT:
A method is presented for the vapor deposition of a material film upon a substrate. The method comprises the use of a Jet Vapor Deposition process with a vaporized polymer gas flowing at supersonic velocity. The vaporized polymer gas consists of a carrier gas and a vaporized polymer, such as Parylene. The vaporized polymer gas impinges upon the substrate through a port and forms the material film.
REFERENCES:
patent: 4788082 (1988-11-01), Schmitt
patent: 4957061 (1990-09-01), Ando et al.
patent: 5104634 (1992-04-01), Calcote
patent: 5256205 (1993-10-01), Schmitt, III et al.
patent: 5310583 (1994-05-01), Eckstein et al.
patent: 5356672 (1994-10-01), Schmitt, III et al.
patent: 5356673 (1994-10-01), Schmitt et al.
patent: 5571332 (1996-11-01), Halpren
patent: 5650197 (1997-07-01), Halpern
patent: 5720821 (1998-02-01), Halpern
patent: 5759634 (1998-06-01), Zang
patent: 5935638 (1999-08-01), Chandra et al.
"High-Quality MNS Capacitors Prepared by Jet Vapor Deposition at Room Temperature" by Dechang Wang, Tso-Ping Ma, John W. Golz, Bret L. Halpern and Jermone J. Schmitt IEEE Electron Device, ERS, vol. 13, No. 9 Sep. 1992, pp 482-484.
Graves Raymond F.
Halpern Bret
Beck Shrive
Chen Bret
Jet Process Corporation
LandOfFree
Method for hydrogen atom assisted jet vapor deposition for paryl does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for hydrogen atom assisted jet vapor deposition for paryl, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for hydrogen atom assisted jet vapor deposition for paryl will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-992131