Method for heat treating synthetic quartz glass for optical use

Glass manufacturing – Processes – With chemically reactive treatment of glass preform

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C065S111000, C065S426000, C065S900000

Reexamination Certificate

active

07093465

ABSTRACT:
An object of the present invention is to overcome the problems of the prior art technique, and to provide a heat treatment method as well as a heat treatment apparatus capable of heat treating, with higher efficiency, a synthetic quartz glass for optical use having higher homogeneity and higher purity. Another object of the present invention is to provide and a synthetic quartz glass for optical use.The problems above are solved by, in a method for heat treating a flat cylindrical synthetic quartz glass body provided as the object to be heat treated in a heating furnace, a method for heat treating a synthetic quartz glass for optical use comprising preparing a vessel made of quartz glass and having a flat cylindrical space for setting therein the object synthetic quartz glass body, placing two or more object synthetic quartz glass bodies into the vessel in parallel with each other, filling the space with SiO2powder, setting the vessel inside the heating furnace with its lid closed, and applying the heat treatment to the vessel.

REFERENCES:
patent: 6578382 (2003-06-01), Ueda et al.
patent: 0 921 104 (1999-06-01), None
patent: 62-100436 (1987-05-01), None
patent: 63-218522 (1988-09-01), None
patent: 8-81225 (1996-03-01), None
patent: 8-91857 (1996-04-01), None
patent: 10-279322 (1998-10-01), None
patent: WO 9716382 (1997-09-01), None
Patent Abstract of Japan vol. 1996, No. 68, Aug. 30, 1996 & JP 08 091857 A TOSOH Corp, Apr. 9, 1996 abstract.
Patent Abstracts of Japan vol. 1999, No. 1, Jan. 29, 1999 & JP 10 279322 A (Nikon Corp), Oct. 20,1998 abstract.
Patent Abstracts of Japan vol. 11, No. 315 (C-451), Oct. 14, 1987 & JP 62 100436 A (Asahi Glass Co LTD), May 9,1987 abstract.
Patent Abstracts of Japan vol. 1996, No. 7, Jul. 31, 1996 & JP 08 081225 A (Sumitomo Metal Ind LTD), Mar. 26, 1996 abstract.
Patent Abstracts of Japan for JP 63-218522 published Sep. 12, 1988.
Patent Abstracts of Japan for JP 8-91857 published Apr. 9, 1996.
Patent Abstracts of Japan for JP 10-279322 published Oct. 20, 1998.
Patent Abstracts of Japan for JP 62-100436 published May 9, 1987.
Patent Abstracts of Japan for JP 8-81225 published Mar. 26, 1996.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for heat treating synthetic quartz glass for optical use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for heat treating synthetic quartz glass for optical use, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for heat treating synthetic quartz glass for optical use will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3642794

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.