Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Patent
1992-11-19
1994-11-15
Kunemund, Robert
Single-crystal, oriented-crystal, and epitaxy growth processes;
Forming from vapor or gaseous state
With decomposition of a precursor
117106, 117 90, 117 7, 117913, C30B 2502
Patent
active
053637992
ABSTRACT:
A method for growth of a crystal wherein a monocrystalline seed is arranged on a substrate and a monocrystal is permitted to grow with the seed as the originating point, comprises the step of:
REFERENCES:
patent: 3585088 (1971-06-01), Schwuttke et al.
patent: 3620833 (1971-11-01), Gleim et al.
patent: 3634143 (1972-01-01), Brennan
patent: 3655439 (1972-04-01), Seiter
patent: 4147584 (1979-04-01), Garrison et al.
patent: 4361600 (1982-11-01), Brown
patent: 4448632 (1984-05-01), Akasaka
Brice, "Crystal Growth Processes", John Wiley and Sons, Blackie and Sons, Bishopbriggs, Glasgow 1986 p. 249.
Smith et al, "Graphoepitaxy and Zone Melting Recrystallization of Patterned Films", Journal of Crystal Growth, vol. 63, 1983, pp. 535-537.
Nishigaki Yuji
Yamagata Kenji
Yonehara Takao
Canon Kabushiki Kaisha
Kunemund Robert
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