Method for growing thin oxide films

Details Method for growing thin oxide films Method for growing thin oxide films

2008-05-27

2008-05-27

Kunemund, Robert (Department: 1792)

Single-crystal, oriented-crystal, and epitaxy growth processes;

Forming from vapor or gaseous state

With a step of measuring, testing, or sensing

C117S089000, C117S090000, C117S104000

Reexamination Certificate

active

11210240

ABSTRACT:
A method is provided for growing thin oxide films on the surface of a substrate by alternatively reacting the surface of the substrate with a metal source material and an oxygen source material. The oxygen source material is preferably a metal alkoxide. The metal source material may be a metal halide, hydride, alkoxide, alkyl, a cyclopentadienyl compound, or a diketonate.

REFERENCES:
patent: 4058430 (1977-11-01), Suntola et al.
patent: 5922405 (1999-07-01), Kim et al.
patent: 6037003 (2000-03-01), Gordon et al.
patent: 6258157 (2001-07-01), Gordon
patent: 6632279 (2003-10-01), Ritala et al.
patent: 6932867 (2005-08-01), Ritala et al.
patent: WO 98/46617 (1998-10-01), None
Drozd et al., “Synthesis of oxide superalloys by ML-ALE method.”Applied Surface Science, vols. 82/83, pp. 587-590 (1994).
Niinisto et al., “Synthesis of oxide thin films and overlayers by atomic layer epitaxy for advanced application,”Materials Science and Engineering, vol. B41, pp. 23-29 (1996).
Leskela et al., “ALD precursor chemistry: Evolution and future challenges,”J. Phys. IV France, vol. 9, pp. Pr8-837-Pr8-852 (1999).
Suntola, “Atomic layer epitaxy,”Thin Solid Films, vol. 216, pp. 84-89 (1992).

Affiliated with

Also associated with

Rating

Method for growing thin oxide films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for growing thin oxide films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for growing thin oxide films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3940578