Method for growing silicon-including film by employing plasma de

Details Method for growing silicon-including film by employing plasma de Method for growing silicon-including film by employing plasma de

1983-06-20

1984-11-06

Pianalto, Bernard D.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 47, 427 86, 427 95, B05D 306

Patent

active

044812299

ABSTRACT:
A method for growing a silicon-including film is disclosed in which the above film is grown on a surface of a substrate by using, as a discharge gas, a halogenide silicon gas or a gas mixture containing a halogenide silicon gas in a plasma deposition apparatus including a vacuum chamber, means for supplying microwave power to the vacuum chamber, means for forming a magnetic field in at least part of the vacuum chamber, means for introducing the discharge gas into the vacuum chamber, and means for holding the substrate within the vacuum chamber.

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