Method for growing silicon carbide whiskers

Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

501 88, C01B 3136

Patent

active

050395017

ABSTRACT:
Method for rapidly growing silicon carbide whiskers having high aspect ratios comprising heating a carbon substrate to between about 1600.degree. C. and 1800.degree. C. and thereat contacting the substrate with a reactive atmosphere consisting essentially of gaseous species of silicon, carbon, nitrogen, sulfur and a group II metal selected from the group consisting of calcium, magnesium and barium.

REFERENCES:
patent: 4536379 (1985-08-01), Carlson et al.
patent: 4605542 (1986-08-01), Harada
patent: 4855119 (1989-08-01), Minamikata et al.
Egashira et al., Growth of beta-silicon carbide whiskers from vapor phase via silicon sulfide intermediate, Yogyo Kyokaishi, 93(9), 535-40.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for growing silicon carbide whiskers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for growing silicon carbide whiskers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for growing silicon carbide whiskers will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1526340

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.