Fishing – trapping – and vermin destroying
Patent
1993-01-22
1995-03-21
Nguyen, Nam
Fishing, trapping, and vermin destroying
437 3, 437 5, 437 81, 437 84, 437102, 437126, 437133, 437965, 148DIG64, H01L 3118
Patent
active
053995031
ABSTRACT:
A method for growing an epitaxial layer of a group II-VI tenary or quaternary compound on a substrate. In particular a HgCdTe semiconductor layer is grown on a substrate such as sapphire which does not interdiffuse with the materials in the semiconductor layer. Initially a crystalline CdTe semiconductor layer is formed on the substrate and then the substrate with the CdTe layer thereon is placed into an enclosure along with a Hg-Cd-Te source that is rich in Te. The substrate and the source are then heated so as to establish three-phase equilibrium conditions in the enclosure whereby vapors from the source are transported to the CdTe layer and the latter is converted into a ternary semiconductor compound having the composition Hg.sub.1-x Cd.sub.x Te. The substrate with the Hg.sub.1-x Cd.sub.x Te epitaxial layer thereon is useful as a sensing device.
REFERENCES:
patent: 3619283 (1971-11-01), Carpenter
patent: 3725135 (1973-04-01), Hager et al.
patent: 4317689 (1982-03-01), Bowers et al.
patent: 4401487 (1983-08-01), Lockwood
patent: 4418096 (1983-11-01), Gauthier et al.
patent: 4435224 (1984-03-01), Durand
patent: 4447470 (1984-05-01), Kay
patent: 4487813 (1984-12-01), Kay
patent: 4566918 (1986-01-01), Irvine et al.
patent: 4648917 (1987-03-01), Kay et al.
patent: 4697543 (1987-10-01), Abbott et al.
patent: 4846926 (1989-07-01), Kay et al.
patent: 4853078 (1989-08-01), Miyazaki
patent: 4906325 (1990-03-01), Bernardi
Journal of Vacuum Science Technology, vol. A5, No. 6, Nov. 1987, pp. 3383-3385, Fleming et al., "Control of the surface composition of isothermal vapor phase epitaxial mercury cadmium telluride".
Database Inspec. Institute of Electrical Engineers, 1824751, Koguchi et al., "Isothermal epitaxial growth of Hg/sub x/Cd/sub 1-x/Cr/sub 2/Se/sub 4/solic-solution thin films on CdCr/sub 2/Se/sub 4/single crystal substrates" & Journal of the Japan Institute of Metals, Japan, vol. 45, No. 7, Jul. 1981, pp. 740-745. GB-A-929 865 (International Business Machines Corp.), p. 1, line 18-line 74.
Chinese Physics, Jul.-Sep., vol. 8, No. 3, pp. 804-807, Kong, et al., "Growth of epitaxial films of the ternary compound HglxCdxSe by using vaport transport technique".
Kochi Tetsuya
Ozaki Kazuo
Saito Tetsuo
Yamamoto Kosaku
Yamamoto Tamotsu
Fujitsu Limited
Nguyen Nam
Paladugu Ramamohan Rao
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