Method for grinding the surface of a semiconductor wafer

Abrasive tool making process – material – or composition – Impregnating or coating an abrasive tool

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

51325, 125 1101, 125 1119, B24B 100

Patent

active

049475983

ABSTRACT:
A dresser made of bonded alundum-type abrasive is ground by a rotating blade made of bonded super abrasive to dress the blade. The surface of a semiconductor wafer is ground by the rotating dressed blade to convert it into a matte-finished surface substantially free from saw marks.

REFERENCES:
patent: 4226055 (1980-10-01), Komanduri et al.
patent: 4411107 (1983-10-01), Sekiya et al.
"Diamond Wheel Catalog"; Accurate Diamond Tool Corporation, Catalog No. 72.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for grinding the surface of a semiconductor wafer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for grinding the surface of a semiconductor wafer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for grinding the surface of a semiconductor wafer will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-453546

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.