Method for generating structures in micro-mechanics

Details Method for generating structures in micro-mechanics Method for generating structures in micro-mechanics

1986-06-16

1988-08-02

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

C25F 314

Patent

active

047612100

ABSTRACT:
A method for generating patterned structures on a monolith substrate in micro-mechanics to permit the production of at least two successive structurings with the depths required in micro-mechanics. At least two different, selectively removable etching masks which are etchable by different etching agents are applied in sequence to the substrate. A first structuring or patterning step is then employed after the last etching mask has been generated. A further etching step occurs after the removal of the last etching mask through the use of the etching masks then remaining on the substrate. The removal of additional etching masks and generating further structuring steps are repeated until the number of etching steps that have been carried out is the same as the number of etching masks that had been originally present on the monolith substrate.

REFERENCES:
patent: 4113486 (1978-09-01), Sato
patent: 4135964 (1979-01-01), Tanaka
patent: 4615782 (1986-10-01), Namatsu et al.
Chemical Abstracts, vol. 99, item 57518y entitled "Etching of Metals", published Aug. 22, 1983, p. 226.

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