Radiant energy – Means to align or position an object relative to a source or...
Patent
1984-03-23
1986-04-08
Anderson, Bruce C.
Radiant energy
Means to align or position an object relative to a source or...
2504922, H01J 3700
Patent
active
045815372
ABSTRACT:
A method of forming inspection patterns for inspecting a workpiece, e.g., for electron beam inspection of optical photomasks. The inspection patterns are formed from the workpiece patterns themselves by applying a first positive windage to the workpiece patterns, inverting the first positive windaged workpiece patterns and applying a second positive windage to the inverted first positive windaged workpiece patterns. The inspection patterns so produced will contain the requisite guard band and the requisite overlap of abutting patterns.
REFERENCES:
patent: 4219731 (1980-08-01), Migitaka et al.
patent: 4357540 (1982-11-01), Benjamin et al.
patent: 4365163 (1982-12-01), Davis et al.
patent: 4475037 (1984-10-01), Vettiger et al.
patent: 4494004 (1985-01-01), Mauer, IV et al.
Wilson et al., Automatic Elec. Beam Fabrication of Micron-Size Devices, Scanning Electron Microscopy, Apr. 1976, pp. 659-668.
IBM TDB, vol. 22, No. 12, May 1980, "Mask Inspection Using Electron-Beam Systems", W. D. Grobman, p. 5540.
J. Vac. Sci. Technol., 20(1), Jan. 1982, "An Automated VLSI-Mask Inspection System", M. Migitaka, K. Mizukami, Y. Hisamoto, and Y. Wada, pp. 26-32.
J. Vac. Sci. Technol., 19(1), May/Jun. 1981, "Studies on an Electron-Beam Mask-Defect Inspection", Y. Wada, Y. Hisamoto, K. Mizukami, and M. Migitaka, pp. 36-39.
Proceedings of SPIE-The International Society for Optical Engineering, vol. 334, Mar. 31-Apr. 1, 1982, Santa Clara, California, "Detecting Submicron Pattern Defects on Optical Photomasks Using an Enhanced EL-3 Electron-Beam Lithography Tool", R. A. Simpson, D. E. Davis, pp. 230-237.
Guillaume Wallace J.
Loughran John F.
Rogoyski Jan
Simpson Robert A.
Weber Edward V.
Anderson Bruce C.
Bigel Mitchell S.
Guss Paul A.
International Business Machines - Corporation
Lashmit Douglas A.
LandOfFree
Method for generating inspection patterns does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for generating inspection patterns, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for generating inspection patterns will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2067886