Method for generating dynamic mask pattern

Details Method for generating dynamic mask pattern Method for generating dynamic mask pattern

2008-01-22

2008-01-22

Ghyka, Alexander (Department: 2812)

Semiconductor device manufacturing: process

Miscellaneous

C430S005000, C716S030000, C257SE21380

Reexamination Certificate

active

11160921

ABSTRACT:
A dynamic mask module is disclosed, which comprises a microcomputer system, a mask pattern generator and a light source. The mask pattern generator is disposed over a substrate and electrically connected to the microcomputer system. The microcomputer system transmits an image signal to the mask pattern generator. The light source is disposed over the mask pattern generator to a photo-resist layer on the substrate. The mask pattern generated by the dynamic mask module is a dynamic image and the mask pattern can be changed on anytime. In addition, the manufacturing cost can be and the manufacturing time can be reduced.

REFERENCES:
patent: 5105215 (1992-04-01), Liu
patent: 2002/0192572 (2002-12-01), Lau
patent: 2004/0265707 (2004-12-01), Socha

Affiliated with

Also associated with

Rating

Method for generating dynamic mask pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for generating dynamic mask pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for generating dynamic mask pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3951033