Nanotechnology – Manufacture – treatment – or detection of nanostructure – Shaping or removal of materials
Reexamination Certificate
2004-08-12
2008-12-02
Brusca, John S. (Department: 1631)
Nanotechnology
Manufacture, treatment, or detection of nanostructure
Shaping or removal of materials
C117S058000, C117S068000, C359S577000
Reexamination Certificate
active
07459614
ABSTRACT:
It is the aim of the invention to provide a technology for the stimulation of the crystallization of biomolecules contained in a liquid solution that leads to significant improvements in the reliability of crystal growth processes and shortens the time and the number of attempts to grow a certain biomolecule crystal, also under the condition that only very small amounts of the biomolecules are available.
REFERENCES:
patent: 6645677 (2003-11-01), Sandstrom
patent: 6882477 (2005-04-01), Schattenburg et al.
patent: 0 997 780 (2000-05-01), None
patent: WO 01/92293 (2001-12-01), None
patent: WO 02/42731 (2002-05-01), None
Chen et al., 50-nm x-ray lithography using synchrotron radiation, Journal of Vacuum Science technology B, vol. 12, Iss. 6, p. 3959-3964, 1994.
Yang X M et al: “Guide self-assembly of symmetric diblock copolymer films in chemically nanopatterned substrates”; Macromolecules, American Chemical Society Easton PA,US; Dec. 26, 2000; XP002223275; pp. 9575-9297; ISSN: 0024-9297.
Grobrecht Jens
Kambach Christian
Padeste Celestino
Solak Harun
Brusca John S.
Paul Scherrer Institut
Skowronek Karlheinz R
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