Method for generating a protective cover for a device

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Insulative housing or support

Reexamination Certificate

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C438S110000, C257S701000, C257S704000

Reexamination Certificate

active

06955950

ABSTRACT:
In a method for generating a protective cover for a device, where a substrate is provided, which comprises the device, first, a sacrificial pattern is generated on the substrate. The sacrificial pattern covers at least an area of the substrate, which comprises the device. Then, a polymer layer is deposited, which comprises at least on sacrificial pattern. Then, an opening will be formed in the polymer layer to expose a portion of the sacrificial pattern. Then, the sacrificial pattern will be removed and the formed opening in the polymer layer is closed.

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Elderstig, H et al., “Spin Deposition of Polymers Over Holes and Cavities”, Sensors and Actuators A 46-47, Elsevier Science S.A., Lausanne, 1995, pp. 95-97 (3 pages).

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