Chemistry of inorganic compounds – Treating mixture to obtain metal containing compound – Radioactive metal
Patent
1997-02-19
1998-09-01
Mai, Ngoclan
Chemistry of inorganic compounds
Treating mixture to obtain metal containing compound
Radioactive metal
423 59, 423249, 376186, 376189, 376190, 976DIG398, C01G 5700, C01G 3902
Patent
active
058024387
ABSTRACT:
An improved method for producing .sup.99m Tc compositions. .sup.100 Mo metal is irradiated with photons in a particle (electron) accelerator to produce .sup.99 Mo metal which is dissolved in a solvent. A solvated .sup.99 Mo product is then dried to generate a supply of .sup.99 MoO.sub.3 crystals. The crystals are thereafter heated at a temperature which will sublimate the crystals and form a gaseous mixture containing vaporized .sup.99m TcO.sub.3 and vaporized .sup.99m TcO.sub.2 but will not cause the production of vaporized .sup.99 MoO.sub.3. The mixture is then combined with an oxidizing gas to generate a gaseous stream containing vaporized .sup.99m Tc.sub.2 O.sub.7. Next, the gaseous stream is cooled to a temperature sufficient to convert the vaporized .sup.99m Tc.sub.2 O.sub.7 into a condensed .sup.99m Tc-containing product. The product has high purity levels resulting from the use of reduced temperature conditions and ultrafine crystalline .sup.99 MoO.sub.3 starting materials with segregated .sup.99m Tc compositions therein which avoid the production of vaporized .sup.99 MoO.sub.3 contaminants.
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Bennett Ralph G.
Christian Jerry D.
Kirkham Robert J.
Tranter Troy J.
Lockheed Martin Idaho Technologies Company
Mai Ngoclan
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