Method for GE-XRF X-ray analysis of materials, and apparatus for

X-ray or gamma ray systems or devices – Specific application – Fluorescence

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378 44, G01N 23223

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active

056848579

ABSTRACT:
A method for GE-XRF (Grazing Exit X-Ray Fluorescence) with high spatial resolution in the direction parallel as well as perpendicular to the specimen surface. The specimen (2) to be examined is irradiated by means of an X-ray beam having a cross-section which is substantially larger than the surface region to be examined. This beam irradiates a large number of parts of the specimen surface and the respective radiation thus excited is measured each time. From all measurements the intensity of the radiation excited by individual pixels in the specimen is calculated by means of a suitable algorithm. The advantage of this method resides in the fact that an X-ray source having a very high intensity (for example, a synchrotron) can be dispensed with and suitable spatial resolution is achieved nevertheless.

REFERENCES:
patent: 5192869 (1993-03-01), Kumakhov
patent: 5305366 (1994-04-01), Nakahara et al.
patent: 5537451 (1996-07-01), Serebryakow et al.
T. Noma et al, "Surface analysis of layered thin films using a synchrotron x-ray microbeam combined with a grazing-exit condition", Rev. Sci Instrum. 65 (4), Apr. 1994, pp. 837-844.
J.R. Rhodes, "Advances In X-Ray Analysis", vol. 23, Plenum Press, New York and London, pp. 263-272. no date.
E.P. Bertin, "Principles and Practice of X-ray Spectrometric Analysis" 2nd ed., Plenum Press, New York-London, chapter 6, paragraph 4, pp. 247-257. no date.
A.M. Cormack, "Inverse Problems", American Mathematical Society, Providence Rhode Island, Apr. 12-13, 1983, SIAM-AMS Proceedings, vol. 14, pp. 33-39.

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