Method for gas phase oxidation using a moderator layer

Details Method for gas phase oxidation using a moderator layer Method for gas phase oxidation using a moderator layer

2007-04-27

2011-11-29

Dentz, Bernard (Department: 1622)

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

Reexamination Certificate

active

08067618

ABSTRACT:
A process for gas phase oxidation in which a gaseous stream which comprises at least one aromatic hydrocarbon and molecular oxygen is passed through one or more catalyst layers, wherein a moderator layer is arranged between two catalyst layers arranged in succession in flow direction of the gaseous stream, the moderator layer being less catalytically active than the catalysts adjacent upstream and downstream or being catalytically inactive. The desired oxidation products are obtained in high yield over prolonged periods.

REFERENCES:
patent: 5225574 (1993-07-01), Aichinger et al.
patent: 6700000 (2004-03-01), Heidemann et al.
patent: 2008/0194844 (2008-08-01), Guckel et al.
patent: 4013051 (1991-11-01), None
patent: 19823262 (1999-12-01), None
patent: 0326536 (1989-08-01), None
patent: 1063222 (2000-12-01), None
patent: WO-2005/063673 (2005-07-01), None
patent: WO-2005/063673 (2005-07-01), None
patent: WO-2006/092305 (2006-09-01), None
patent: WO-2008/022909 (2008-02-01), None
patent: WO-2008/022911 (2008-02-01), None
patent: WO-2009/021924 (2009-02-01), None
patent: WO-2009/124947 (2009-10-01), None
U.S. Appl. No. 12/015,741, filed Jan. 17, 2008, Raichle, et al.
U.S. Appl. No. 12/039,231, filed Feb. 28, 2008, Cremer, et al.
U.S. Appl. No. 12/138,862, filed Jun. 13, 2008, Cremer, et al.
U.S. Appl. No. 12/138,823, filed Jun. 13, 2008, Raichle, et al.
U.S. Appl. No. 12/297,895, filed Oct. 21, 2008, Mauer, et al.
U.S. Appl. No. 12/301,352, filed Nov. 18, 2008, Mackewitz, et al.
U.S. Appl. No. 12/301,370, filed Nov. 18, 2008, Mackewitz, et al.
U.S. Appl. No. 12/301,420, filed Nov. 18, 2008, Wilmer, et al.
U.S. Appl. No. 12/305,698, filed Dec. 19, 2008, Wilmer, et al.
U.S. Appl. No. 12/520,648, filed Jun. 22, 2009, Wilmer, et al.
U.S. Appl. No. 12/936,807, filed Oct. 7, 2010, Wilmer, et al.
International Preliminary Report on Patentability issued on Jan. 15, 2009 in corresponding International Application No. PCT/EP2007/054150.

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