Method for forming window material for solar cells and method fo

Details Method for forming window material for solar cells and method fo Method for forming window material for solar cells and method fo

1990-10-03

1992-09-29

Eldred, J. W.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

427 39, 427 74, 427162, 437101, 357 30, 136258, 148DIG1, B01J 1908, B01J 1912

Patent

active

051512556

ABSTRACT:
A method for forming a dihydride rich amorphous silicon semiconductor film suitable for use as a window material of solar cells only from a silicon material, which comprises decomposing a gaseous mixture composed of disilane, a dopant capable of imparting p-type electrical conductivity and a diluent gas by applying a glow discharge energy, and thereby forming a semiconductor film having an optical band gap of at least 1.8 eV, preferably more than 1.9 eV, on a substrate.

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A. Lucousky et al., Phys. Rev. B19 (1979), p. 2064.
D. J. Fary et al., J. Non-Cryst. Solids, 35-36 (1980), pp. 255, etc.
F. W. Sears et al., University Physics, (1953, p. 64.

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