Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1985-01-23
1986-06-03
Saba, William G.
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
29576E, 29578, 148DIG25, 148DIG26, 148DIG50, 156612, 156613, 156657, 156662, H01L 21205, H01L 2176
Patent
active
045927928
ABSTRACT:
Monocrystalline silicon is deposited on first and second portions of a substrate, the first and second portions having substantially unequal dimensions. The method comprises subjecting the substrate to a silicon-source gas and a predetermined concentration of chloride at a predetermined temperature. The chloride concentration is selected so as to create a substantially equally thick monocrystalline silicon deposit on each of the substrate portions.
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Corboy, Jr. John F.
Jastrzebski Lubomir L.
Cohen Donald S.
Glick Kenneth R.
Morris Birgit E.
RCA Corporation
Saba William G.
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