Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...
Patent
1997-05-29
1998-06-16
Cameron, Erma
Coating processes
Direct application of electrical, magnetic, wave, or...
Polymerization of coating utilizing direct application of...
428 1, 349156, 349157, 349 92, 349 93, 349187, G02F 11339
Patent
active
057666946
ABSTRACT:
A method for forming a uniformly-spaced plastic substrate liquid crystal cell (100) includes the step of forming a cell with a liquid crystal-monomer mixture (150) disposed between upper and lower plastic substrates (111, 112). The cell (100) is then exposed to ultraviolet light (170) causing the monomer to be selectively polymerized to form support walls (108) between substrates (111, 112) of the cell in the light-intense areas. The monomer may be selectively polymerized by exposing the cell (100) through a mask (180, 188). The distance between the substrates (111, 112) is maintained before the walls (108) are formed by dispersing plastic ball spacers (114) between the substrates (111, 112). During exposure to the UV light, the substrates (111, 112) are sandwiched between substantially planar supports (182, 184) to maintain contact between the substrates (111, 112) and the spacers (114) and thus a uniform distance between the substrates (111, 112).
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Late-News Poster: Axially Symmetric Aligned Microcell (ASM) Mode; Electro-Optical Characteristics of New Display Mode with Excellent Wide Viewing Angle, SID Digest, SID 95 Digest, pp. 575-578, 1995.
Bos Philip J.
West John L.
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