Method for forming transparent thin film, transparent thin...

Details Method for forming transparent thin film, transparent thin... Method for forming transparent thin film, transparent thin...

2007-04-24

2007-04-24

McNeil, Jennifer (Department: 1775)

Stock material or miscellaneous articles

Composite

Of b, n, p, s, or metal-containing material

C428S428000, C428S432000, C428S698000, C428S699000

Reexamination Certificate

active

10503022

ABSTRACT:
The present invention provides a method for forming a transparent thin film by a chemical vapor deposition method using a gaseous raw material. In the method, a film growth rate is at least 8 nm/s, and the transparent thin film contains at least one selected from carbon (C) and oxygen (O), nitrogen (N), hydrogen (H), and silicon (Si). According to this method, a transparent thin film that does not peel off a substrate easily due to the eased tension in the thin film and has high transmittance in the visible light region can be deposited on a glass ribbon in a float bath.

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