Method for forming thin films

Details Method for forming thin films Method for forming thin films

2006-05-09

2006-05-09

Stein, Stephen (Department: 1775)

Stock material or miscellaneous articles

Composite

Of inorganic material

C428S689000, C428S702000

Reexamination Certificate

active

07041391

ABSTRACT:
The present invention provides a method for forming a film of aluminum oxide in which a target containing aluminum is sputtered in a gas containing fluorine atoms.The thin film of aluminum oxide according to the present invention has little optical absorption and high refractive index in the ultraviolet and vacuum ultraviolet regions.

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Belkind et al., “Deposition of AIO4FyFilms Using D.C. Reactive Sputtering”, Thin Solid Films, 199, (1991) 279-290.

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