Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Patent
1988-12-07
1990-11-20
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Plural exposure steps
430313, 430318, 430319, 430328, 430964, 156643, G03C 1765, G03C 174
Patent
active
049718967
ABSTRACT:
A method of forming a thin film pattern on a base having a step portion. This method comprises a first step of forming a thin film of given material on the base, a second step of forming a predetermined pattern of a first photoresist film on said thin film at one of a first portion including a lower part of the step portion and a second portion including an upper part of the step portion, a third step of forming a predetermined pattern of a second photoresist film on said thin film at the other of the first and second portions and a fourth step of applying ion-milling to said thin film of given material using masks said first and second photoresist film patterns formed on said thin film at the first and second portions.
REFERENCES:
patent: 4563241 (1984-06-01), Tanaka et al.
Ashida Eiji
Fuyama Moriaki
Hanazono Masanobu
Hara Shin-ichi
Ikeda Hiroshi
Chea Thorl
Hitachi , Ltd.
Michl Paul R.
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