Method for forming thin film pattern

Details Method for forming thin film pattern Method for forming thin film pattern

1996-07-05

1999-01-26

Bell, Janyce

Radiation imagery chemistry: process, composition, or product th

Imaged product

Multilayer

430 17, 430 18, 430198, 430325, 427 64, 427162, 427165, 427226, 427261, 427265, 427266, 427287, 4274071, 4274192, 427510, 427515, 427145, G08C 1100, B05D 500

Patent

active

058636790

ABSTRACT:
The present invention provides a method for forming a thin film pattern having an excellent accuracy of the pattern. The method comprises the steps of:

REFERENCES:
patent: 4715929 (1987-12-01), Ogawa
patent: 5021398 (1991-06-01), Sharma
patent: 5077085 (1991-12-01), Schnur

Affiliated with

Also associated with

Rating

Method for forming thin film pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming thin film pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming thin film pattern will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1449098